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CMOS integrated circuits specified in 3A901.a and parametric signal amplifiers laid out in 3A901.b need a license to all Locations as specified pursuant to your countrywide stability controls and license critique plan established forth in § 742.

4D001 “software package”. Paragraph 4D001.a is revised by including ECCN 4A906 for the exception parenthetical for 4D.

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This hold off in compliance is to allow for submission and processing of license programs or implementation of internal compliance techniques on items included by these ECCNs.

a. Designed to guard ceramic “matrix” “composite” resources specified by ECCN 1C007 from corrosion; and

RS relates to “technological innovation” for commodities controlled in 3A090, when exported from Macau or maybe a spot specified in state team D:five

specialized Notice: for that applications of 3A001.b.one.d, `twin mode' suggests the “vacuum electronic product” beam current may be deliberately improved between continuous-wave and pulsed manner operation by utilization of a grid and creates a peak pulse output electrical power higher than the continual-wave output electrical power.

b or 4A906.c. BIS is adding click here ECCN 4D906 to the CCL to regulate “program” “specially built” or modified for that “growth” or “creation” of commodities controlled by 4A906.b or 4A906.c.

This GL authorizes deemed exports or deemed reexports of quantum “engineering” and “software package” in ECCNs 3D901 (for “application” for quantum goods in ECCNs 3A901.b, 3B904), 3E901 (for “technological know-how” for quantum goods in 3A901, 3A904, 3B904, 3C907, 3C908, 3C909), and “technologies” for quantum items in ECCNs 4D906 or 4E906, to overseas persons whose newest state of citizenship or lasting residency can be a destination specified in Country Group D:one or D:5 and that are not prohibited individuals under aspect 744 in the EAR, e.g.,

Masks and reticles are Just about every comprised of intricate several layer mask blanks. They should be suitable for “Serious ultraviolet” (“EUV”) lithography. As masks and reticles are vital components for EUV lithography, BIS is incorporating 3B001.

c. obtaining any of the following `in-course of action monitoring' machines inside of a `co-axial configuration' or `paraxial configuration':

b. “engineering” in accordance with the General Technology Notice, besides that controlled by 4E001.a, to the “growth” or “output” of apparatus as follows:

The list of things controlled is contained inside the ECCN heading. Be aware one: 3E001 isn't going to Regulate “technology” for equipment or “components” controlled by 3A003.